OMS
Double-beam photometer based on monochromatic measurement of reflectance or transmission. Measuring technology for automated monitoring in optical production processes.
As individual as your needs
As individual as your needs
We supply equipment for monochromatic optical real-time monitoring (OMS), optical low-coherence interferometry (OLCI), optical measurement of film thickness (OTFP – optical thin film probe) and equipment for optical density measurement of metallized films (DISS).
Double-beam photometer based on monochromatic measurement of reflectance or transmission. Measuring technology for automated monitoring in optical production processes.
The Leybold Optics OLCI (optical low-coherence interferometry) series of optical measuring devices were developed for contactless measurement of thickness and surface profile of samples transparent to the measured wavelength of 1310 nm. Leybold Optics OLCI instruments measure absolute thickness with a precision of +/- 1µm, relative thickness with +/- 10 nm and allow the creation of xy-profiles of sample thickness. OLCI comes with its own PC and is used in the glass industry, in ophthalmics, medical coatings and packaging.
OTFP (optical thin film probe) allows fast, precise and contactless measurement of film thickness of smooth, transparent films in the nanometer and micrometer range using thin film interference. Semi-transparent layers and semiconductors can be measured with a spectrometer at λ 200-1100nm and a thickness range of 50nm – 50µm.
Precise measurement of optical density of patterned films combined with pattern recognition and dimensional measurement for the roll-to-roll film coating industry.
Bühler Leybold Optics has been setting benchmarks in optical monitoring for decades. Our very accurate systems allow control of sensitive processes for precision optics and semiconductors, where real time process control is crucial for the best results.
Our measurement devices can be integrated seamlessly into your equipment to ensure maximum accuracy and precision for thickness, thin film, and coating measurements in closed-loop controlled applications.
